Inline process refractometer boosts wafer fab QC

PR-23-M real-time process refractometer from K-Patents measures the concentrations of process liquids in semiconductor fabrication plants. Instrument features inert non-metallic materials on all wetted parts for compatibility with ultra-pure chemicals; it is said to deliver continuous and accurate measurement.

By Control Engineering Staff June 7, 2006

PR-23-M real-time process refractometer from K-Patents measures the concentrations of process liquids in semiconductor fabrication plants. Instrument features inert non-metallic materials on all wetted parts for compatibility with ultra-pure chemicals; it is said to deliver continuous and accurate measurement.

PR-23-M refractometer from K-Patents determines the concentration of dissolved solids by making an optical measurement of a solution’s refractive index.

Device provides an alarm if a chemical composition is not within programmed specifications. It is intended for preventing out-of-spec chemicals from entering the semiconductor process. All-purpose transmitter can be used to measure concentrations of all kinds of process liquids, including HF, HCl, KOH, IPA, PGMEA, NMP, NH4OH, C2H6O2, and CH3COCH. It installs directly into the process pipeline and provides a continuous 4-20 mA or digital measurement signal.

Measurement is based on the company’s optical measurement sensor, which uses a solid-state charged-couple-device camera to provide a digital measurement of refractive index. Measurement accuracy is

— Jeanine Katzel, senior editor, Control Engineering, jkatzel@reedbusiness.com