Motion processor augments wafer throughput

To help its medium- and high-current ion implanters handle delicate semiconductor wafers quickly and precisely, Eaton Corp.'s (Cleveland, O.) Implant Systems Division recently opted for Performance Motion Devices' (PMD) MC1401A Motion Processor for Brushed Servo Motion Control.

04/01/1999


To help its medium- and high-current ion implanters handle delicate semiconductor wafers quickly and precisely, Eaton Corp.'s (Cleveland, O.) Implant Systems Division recently opted for Performance Motion Devices' (PMD) MC1401A Motion Processor for Brushed Servo Motion Control. Eaton integrated MC1401A into a small, general purpose, three-axis motion controller, Micro 3, used in its 300 mm medium-current ion implanter, MC3.

MC1401A's S-motion profile capabilities helped Eaton's controller generate smooth trajectories that reduced cycle times of certain moves by up to 20%.

Designed to control low-current dc brush-type motors and associated sensors and actuators, MC1401A is assisting several MC3 applications, including a wafer aligner, energy analysis slit controller, transfer arm, load lock, and extraction manipulator controllers. MC1401A will also be used in Eaton's next dose controller, which monitors and controls dopant applied to wafers.

For more information, visit www.controleng.com/freeinfo .





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