Milwaukee, WI; Reinach, Switzerland—To deliver preferred device configuration based on existing and emerging industry standards, Rockwell Automation Inc. and Endress+Hauser (E+H) are working jointly to provide users with more convenient, standards-compliant methods for configuring many process instruments.
Milwaukee, WI; Reinach, Switzerland— To deliver preferred device configuration based on existing and emerging industry standards, Rockwell Automation Inc. and Endress+Hauser (E+H) are working jointly to provide users with more convenient, standards-compliant methods for configuring many process instruments. Rockwell adds the firms’ cooperation is part of its broader initiative into the hybrid process applications sector.
Together, the companies will expand device connectivity and configuration capabilities using standard technologies, such as FOUNDATION fieldbus and HART, and implementing and testing the full capability of E+H’s devices with Rockwell’s Allen-Bradley Logix controllers and RSLogix 5000 software. In addition, by using E+H’s FieldCare software, Rockwell will offer configuration, diagnosis and integration of a wide range of process devices into the Rockwell Software’s RSMACC suite of asset management software solutions. This solution will allow Rockwell to offer integration of process devices using both Electronic Device Descriptions (EDD) and the Field Device Tool/Device Type Manager (FDT/DTM) specifications.
To further its commitment to open standards, Rockwell also plans to join E+H and other companies on the steering committee of the FDT/DTM Joint Interest Group to help advance FDT as a configuration and data management interface for text- and graphically based process device profiles.
‘This participation complements our leadership in the Fieldbus Foundation (FF), as we help drive standards that cover the broadest possible range of process devices,’ says Ken Deken, VP and GM of Rockwell’s Logix Netlinx business, and Rockwell’s representative on FF’s board. ‘We see this as a means to help customers more easily manage the wide range of critical and complex process devices.’
Control Engineering Daily News Desk
Jim Montague, news editor
[email protected]
